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 Over 55 international exhibitors will display a full spectrum of equipment, instrumentation, products, software, publications and services.
To be held June 8 – 10 in the Congress Center (Strasbourg, France), the exhibit will be convenient to the technical session rooms and scheduled to coincide with the technical program.
For exhibitors, it will mean an excellent opportunity to meet just the right customers and disseminate information effectively to a large and diverse audience.
For complete information, including exhibit application, space rental fees, floor plan and sponsorship deadlines, please download the following document:
 Exhibition_application_form_10 679.82 Kb  Exhibition_application_form_10 334.50 Kb
A Unique Audience
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E-MRS 2007
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E-MRS 2008
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E-MRS 2009
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19 symposia
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17 symposia
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19 symposia
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2128 attendees
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1904 attendees
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2260 attendees
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112 att./sympo
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112 att./sympo
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119 att./sympo
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Geographical Analysis
The E-MRS Spring Meeting draw an audience from more than 60 countries. Representing quality and quantity, this audience comprises key decision-makers involved in the field of materials research.
2009 Spring Meeting (Top 8)
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France
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357
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UK
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104
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Germany
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354
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Japan
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97
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Italy
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195
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Korea
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95
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Spain
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121
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USA
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86
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Following companies will welcome you at their booth
• ABCR
• ACS PUBLICATIONS
• AJA
• ALFA AESAR
• ANNEALSYS
• ARCANE - CENBG
• BRUKER
• CAMBRIDGE UNIVERSITY PRESS
• CENTROTHERM
• CHEMAT TECHNOLOGY
• DR. EBERL MBE-KOMPONENTEN
• DTF TECHNOLOGY
• EDP SCIENCES
• ELSEVIER
• ETSF
• EUROPEAN SCIENCE FOUNDATION
• FEI COMPANY
• FHR
• GOODFELLOW
• HYPERTECH
• INEL
• IOP PUBLISHING
• ISIS
• KEMSTREAM
• KP TECHNOLOGY
• KURT J. LESKER
• LOT-ORIEL
• LOVALITE
• MATECK
• NANOFACTORY INSTRUMENTS
• NANONICS
• NANOTEC ELECTRONICA
• NEYCO
• NT-MDT
• OPTOPHASE
• ORSAY PHYSICS
• OXFORD UNIVERSITY PRESS
• PARK SYSTEMS
• PLASMA TECHNOLOGY LTD
• PLASMIONIQUE
• RAITH
• RSC PUBLISHING
• SENTECH
• SIGMA-ALDRICH
• SPECS
• SPRINGER
• STAIB INSTRUMENTE
• STREM
• SURFACE
• TAYLOR & FRANCIS
• VG SCIENTA
• VINCI TECHNOLOGIES - DIVISION MECA 2000
• WILEY
• ZWICK
The E-MRS 2010 Conference is funded, in part, by the generous contributions of these organizations:
• FEI ELECTRON OPTICS BV
• JEOL EUROPE
• JEOL ITALY
• FRC (symposium C)
• AIXTRON (symposium H)
• DUAL LOGIC (symposium H)
• IBM (symposium H)
• SAFC (symposium H)
• AJA (symposium L)
• EPPRA (symposium L)
• AVANCIS (symposium M)
• FIRST SOLAR (symposium M)
• ROTH & RAU (symposium M)
• ASSING SpA (symposium P)
• GDRI (symposium P)
• NT-MDT (symposium P)
• FEI EUROPE (symposium Q)
• HREM RESEARCH INC. (symposium Q)
• OXFORD INSTRUMENTS SAS (symposium Q)
• CEOS (symposium Q)
• EMS (symposium Q)
• NANOFACTORY (symposium Q)
• AMPLITUDE SYSTEMES (symposium R)
• FIANIUM (symposium R)
• LASING SA (symposium R)
• NEWPORT-SPECTRA PHYSICS (symposium R)
• QUANTEL (symposium R)
• YOKOGAWA (symposium R)
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