| 2002 SPRING MEETING |
June 18-21, 2002 |
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| Plenary Session Program | |
| A | ATOMIC SCALE MATERIALS DESIGN J. Greer (Ireland), A. Korkin (USA), J. Hafner (Austria), M. Finnis (UK), M. Djafari-Rouhani (France) |
| B | THIN FILM CHALCOGENIDE PHOTOVOLTAIC MATERIALS R.W. Birkmire (USA), D. Cahen (Israel), D.Lincot (France), H.W. Schock (Germany), T. Wada (Japan) |
| C | COLLOIDS 2002 C. Degueldre (Switzerland), H. Geckeis (Germany), J.C. Petit (France), W. van Riemsdijk (The Netherlands) |
| D | PHYSICS & CHEMISTRY OF ADVANCED LASER MATERIALS PROCESSING V. Craciun (Romania), E. Fogarassy (France), W. Kautek (Germany), M. Meunier (Canada) |
| E | ADVANCED CHARACTERIZATION OF SEMICONDUCTOR MATERIALS AND DEVICES V. Raineri (Italy), Y. Rosenwaks (Israel), W. Vandervorst (Belgium) |
| F | ORGANIC MATERIALS FOR DEVICE APPLICATIONS D. Schmeißer (Germany), W. Riess (Switzerland) |
| G | TPP7: THERMAL PLASMA PROCESSES J. Amouroux (France), S. Dresvin (Russia), P. Fauchais (France), D. Neutschutz (Germany), J. Van der Mullen (The Netherlands) |
| H | Si-BASED OPTO-ELECTRONICS: ADVANCES & FUTURE PERSPECTIVES W. X. Ni (Sweden), F. Priolo (Italy), D. Grützmacher (Switzerland), R. Tsu (USA) |
| I | SYNCHROTRON RADIATION AND MATERIALS SCIENCE H. Amenitsch (Austria), J. Baruchel (France), F. Boscherini (Italy), J. Goedkoop (The Netherlands), S. Heun (Italy) |
| J | GROWTH AND EVOLUTION OF ULTRATHIN FILMS: SURFACE AND INTERFACE GEOMETRIC AND ELECTRONIC STRUCTURE J.W.M. Frenken (The Netherlands), K.Horn (Germany), G. Le Lay (France), D.P. Woodruff (UK) |
| K | THIN-FILM MATERIALS FOR LARGE AREA ELECTRONICS P. Roca i Cabarrocas (France), M. Stutzmann (Germany), J. Robertson (UK), G. Fortunato (Italy) |
| L | CRYSTAL CHEMISTRY OF FUNCTIONAL MATERIALS II P. Majewski (Germany), A. Fuertes (Spain), R. Cloots (Belgium) |
| M | N-CONTAINING III-V SEMICONDUCTORS: FUNDAMENTALS AND APPLICATIONS W.M. Chen (Sweden), E. O'Reilly (Ireland), A. Forchel (Germany), C.W. Tu (USA) |
| N | NANO AND MICRO-COMPOSITE R.P. Hjelm (USA), M. Gerspacher (USA), A. Le Mehaute (France), R. Schuster (Germany), F. Tsobnang (France) |
| O | THE 300 mm SILICON ERA: MATERIAL, EQUIPMENT, TECHNOLOGY H. Richter (Germany), M. Umeno (Japan), P. Wagner (Germany) |
| P | ADVANCED MATERIALS FOR MICROELECTRONICS: FERROELECTRICS AND LOW-k DIELECTRICS I. Fragala (Italy), D. Wouters (Belgium), R. Zambrano (Italy), P. Rabinzohn (France), E. Mergenthaler (Germany) |
| Q | CURRENT TRENDS IN NANOTECHNOLOGIES: FROM MATERIALS TO SYSTEMS W. Jantsch (Austria), H. Grimmeiss (Sweden), G. Marletta (Italy), Y. Taga (Japan) |
| R | MICROSTRUCTURED BIOMATERIAL SURFACES R. Barbucci (Italy), A. Curtis (UK), A.C. Albertsson (Sweden) |
| S | MICRO- AND NANO-STRUCTURED SEMICONDUCTORS I. Berbezier (France), A. Nassiopoulou (Greece), S. Nozaki (Japan) |
| Une réalisation advisa.fr |  |