E-MRS 2011 Fall Meeting - Symposium K

Solution-derived electronic-oxide films, nanostructures and patterning, from materials to devices

 Symposium K 609.75 Kb

Introduction and scope:

Current scientific and technological advances in the field of solution-derived electronic-oxide films and nanostructures for a broad range of applications will be addressed. Beside established approaches the focus will be on novelties, including nanostructures, hybrid materials, direct-writing low-temperature processing, and integration.

Solution processing of electronic-oxide materials in the form of thin films, 2D or 1D structures represents an easy pathway to various devices in the fields of micro- and opto-electronics, sensorics, actuation, energy storage or conversion. Solution-based methods are generally more flexible in terms of precursor or substrate selection and related processing, faster and cheaper as compared to vapor deposition routes.

The symposium will address solution processing of different groups of materials with specific functionalities depending on processing conditions, as for example transparent conductive oxides which can be used in amorphous phase, exhibiting a low enough resistivity, and can be therefore processed at temperatures as low as 200 oC or (tunable) ferroelectric thin films, which require high processing temperatures, often exceeding 600 oC, to obtain the required dielectric response. Solution processing of materials and structures for energy efficiency and solar-energy storage will be addressed.

Novel direct patterning methods allow faster processing and represent an exciting alternative to established solution deposition of thin films combined with lithographic techniques. Implementation of flexible polymer substrates requires design of solutions and processing schemes with maximum temperatures not exceeding 200 oC. The influence of processing on materials and functional properties of thin films and structures will be addressed. Finally, integration issues in realization of devices should be considered.

The major aim of this symposium is to offer an overview and a forum for the interchange of information and expertise on the cutting-edge research, advanced technologies and applications in the field of solution-derived electronic-oxide thin films, patterned structures and related devices.

Hot topics to be covered by the symposium:

• Solution chemistry
• Environmentally friendly processes
• Deposition of thin films
• Wet non-lithographic patterning
• Low-temperature processing
• Interfaces and nanoscale effects
• Materials: ferroelectrics, tunable ferroelectrics, dielectrics, multiferroics, oxide semiconductors, transparent conductive oxides (TCOs), materials for energy efficiency (e.g. superconducting films) and solar energy conversion,…
• Nano-composites and hybrid materials
• 1D nanostructures: from materials to devices
• Integration, devices

Invited speakers:

• Maria Zaharescu, Institute of Physical Chemistry of the Romanian Academy, Bucharest, Romania
• Michael Bäcker, Zenergy Power GmbH Heisenbergstr. 16 53359 Rheinbach, Germany
• Jochen Stollenwerk, Fraunhofer Institute for Laser Technology, Aachen, Germany
• Tomoya Ohno, Kitami Institute of Technology, Kitami, Japan
• Gabriela Carja, Faculty of Chemical Engineering and Environmental Protection, Technical University “Gh. Asachi” of Iasi, Iasi, Romania
• Geoffrey L. Brennecka, Sandia National Laboratories, Albuquerque, NM USA
• Narcís Mestres, Institut de Ciència de Materials de Barcelona ICMAB, Consejo Superior de Investigaciones Científicas CSIC, 08193 Bellaterra, Catalonia, Spain
• Kazumi Kato, National Institute of Advanced Industrial Science and Technology (AIST), Japan
• Johan E. ten Elshof, MESA+ Institute for Nanotechnology, University of Twente, Enschede, Netherlands
  
• Plinio Innocenzi, Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT) and CR-INSTM, D.A.D.U., Università di Sassari, Alghero (Sassari), Italy
• Alexander Kamyshny, Institute of Applied Chemistry, Institute of Chemistry, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem Israel
• Peer Löbmann, Fraunhofer-Institut für Silicatforschung, Würzburg, Germany
• Urška Lavrencic Stangar, Laboratory for Environmental Research, University of Nova Gorica, Nova Gorica, Slovenia
  
• Anka Duta, Transilvania University, Brasov, Romania
• An Hardy, Hasselt University, Institute for Materials Research, Inorganic and Physical Chemistry, Diepenbeek, Belgium and IMEC vzw, Division IMOMEC, Diepenbeek, Belgium

Scientific committee members:

• Michel A. Aegerter, USA
• Dan Dascalu, IMT, Romania
• Gerwin Gelinck, TNO, The Netherlands
• An Hardy, Hasselt University, Belgium
• George Kiriakidis, University of Crete, Greece
• Marija Kosec, JSI, Slovenia
• Rodrigo Martins, CEMOP/UNINOVA, Portugal
• Paul Muralt, EPFL, Switzerland
• Jesus Ricote, CSIC-ICMM, Spain
• Hisao Suzuki, Shizuoka University, Japan
• Jenny Tellier, SPCTS Limoges, France
• Susan Trolier McKinstry, Pennsylvania State University, USA
• Polona Umek, JSI, Slovenia
• Paula Vilarinho, University of Aveiro, Portugal
• Qi Zhang, Cranfield University, UK

Symposium organizers:

Barbara Malic
Jožef Stefan Institute
Jamova 39
Slovenia
Phone + 386 1 4773 431
Fax + 386 1 4773 887
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Viorica Musat
Dunarea de Jos University of Galati
Domneacsa 47
800201 Galati
Romania
Phone: +40757070613
Fax: +40236460754
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Marlies Van Bael
University of Hasselt & IMEC
Agoralaan, Building D
3590 Diepenbeek
Belgium
Phone +32 11 268307
Fax +32 11 268301
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Theodor Schneller
Institute of Materials in Electrical Engineering and Information Technology 2 (IWE 2)
Sommerfeldstraße 24
Aachen
Germany
Phone: +49 (241) 80-27820
Fax: +49 (241) 80-22300
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