ANNEALSYS
Bat T2, PIT de la Pompignane
Rue de la Vieille Poste
34055 Montpellier Cedex 1
Phone : +33 467 20 23 63
Fax : +33 467 20 26 89
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Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition equipment for research and development and production applications.

Annealsys provides worldwide sales and service.

RTP systems are available from 2 to 8-inch wafers for RTP and RTCVD processes. Cold wall chamber, lamp furnace, high temperature (>1500°C) and turbo pumping capability are the main features.

MOCVD systems include 2-inch, 4-inch and 6-inch machines dedicated to metal and alloys, oxides, transition metal nitrides, carbon nanotubes and other materials.

2-inch spray CVD system with in-situ annealing capability and 4-inch LPCVD furnace are also available.

Annealsys is representative of Cambridge Nanotech ALD systems in France, Belgium and Switzerland.