SENTECH GmbH
Bahnstr. 3
D-82131 Stockdorf
Germany
Phone: +49 89 857-6049
Fax: +49 89 857-6642
E-mail: This e-mail address is being protected from spam bots, you need JavaScript enabled to view it
Web site: www.sentech-sales.de

• Plasma Process Technology and
• Thin Film Metrology

SENTECH Instruments GmbH is located in Berlin, Germany
and manufactures systems for Plasma Process Technology
and Thin Film Metrology.

Plasma Process Systems

SI 500 ICP-RIE Etch system for low damage etching and high rate processes. Applications: quantum dots, Bragg mirrors, laser diodes, wave guides, photonic crystals, etc.	Etchlab 200 Low cost RIE etch system for R&D for processing of semiconductors, dielectrics and metals. Upgradeable with load lock and turbo pump.

PECVD Systems SI 500 D
PECVD Deposition system for high quality low temperature depositions
(80°C-100°C) and layers with variable stress.

Thin Film Metrology

SENTECH Instruments develops optical instruments for the
characterization of thin films and of complex layer systems:
Reflectometers, Laser ellipsometers, spectroscopic ellipsometers
an in line systems.

SENDIRA MIR Spectroscopic ellipsometer (6000 cm-1 – 400 cm-1) an ideal tool to measure epitaxial layer systems in compound semiconductors with absolute precision. The SENDIRA provides detailed chemical, mechanical, electrical and optical information on complex layer systems.	SENresearch DUV-VIS-NIR Spectroscopic ellipso-meter for research and development. Broad spectral range from 190 nm to 2,500 nm, multiplexing measurement technique for highest precision and fast measurements.