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2010 R: Laser processing and diagnostics for micro and nano applications


pdf Program 2010 R 781.74 Kb

Instructions for the preparation of manuscripts.
After the reviewing procedure, all accepted papers based on contributions presented at the Symposium will be published as a Special Issue of Applied Surface Science (Elsevier). The submission website for this journal is located at: http://ees.elsevier.com/apsusc/default.asp.
Only submissions through the Elsevier Editorial System will be accepted. The manuscript deadline is extended to 12th of June 2010.
pdf Instructions_for_Manuscript 80.55 Kb
doc Manuscript_Coverpage 113.00 Kb

Scope of the symposium:
The primary goal of the EMRS is to promote the materials agenda within the European Research Community, focusing on both fundamental and applied issues concerning materials development, assessment, functionality, and applications. This proposed symposium addresses laser and plasma materials synthesis, processing, and diagnostics with the special emphasis on micro-and nano-scale applications across a broad range of science and technologies, directed towards both fundamental and applied end goals. Laser ablation, patterning, micro/nano structuring, microanalysis and laser synthesis of nanomaterials of materials have been applied across the full range of scientific disciplines, covering materials science, engineering, photonics, biophotonics, display technologies and opto- and micro-electronics for biosensing and environmental monitoring. The recent widespread availability of high power and ultrashort pulse lasers has also opened up the realm of multiphoton materials processing, enabling the fabrication of subsurface structures inside functional dielectric hosts, laser direct write techniques and true nanoscale materials engineering, where structures of sub-wavelength dimensions can be designed and produced using photons. This symposium will focus on the inherent interdisciplinarity of laser and plasma materials processing, and will engage across the broadest range of topic areas. There will be great emphasis on the scope for research collaboration between laser scientists and those in the biological and life sciences arenas, where the challenge exists for building bridges across these otherwise dissimilar fields. A dedicated session will address hot topics within the bioscience area, where laser and plasma processing can make significant inroads.

List of topics:
- Ultrashort laser pulse interaction with materials: diagnostics, modeling, materials processing and characterization
- Laser processing of polymers, biomolecules and biomaterials
- Laser assisted fabrication for sensors (bio-, chemical- and environmental-)
- Lasers for synthesis, structuring and manipulation of new materials: nanotubes, clusters and nanoparticles
- Pulsed laser deposition of thin films: new materials and applications
- Nanoscale processing by near-field techniques
- 3D micro-structuring for MEMS, MOEMS, photonic crystals and photonic applications
- Direct laser printing and laser lithography
- Laser and plasma processing and characterization of nano-structured materials
- Laser-based spectroscopy of nanomaterials and thin films
- Diagnostics of laser induced plasmas.

List of invited speakers (tentative list):
- Alberto Pique, Naval Research Laboratory, Washington, “Laser Direct Printing”
- Arnold Craig, Princeton University, "Blister actuated laser induced forward transfer for printing organic materials"
- Maryline Guilloux-Viry, Université de Rennes “New ferroelectric oxide films by PLD“
- Ionut Enculescu, National Institute of Materials Physics, Bucharest, “Nanowires with tailored properties by a template approach“
- Georg Müller, Forschungszentrum Karlsruhe GmbH, Karlsruhe, “Surface modification of materials with pulsed electrical discharges“
- Anton Plech, Fachbereich Physik der Universität Konstanz, “Femtosecond pulse near-field ablation of metal nanoparticles”
- Y. Bellouard, Eindhoven University of Technology, “Ultrafast laser in micro and nanoscale engineering for MEMS”

International Advisory Committee:
S. Amoruso - CNR-INFM Napoli (Italy), P. Atanasov - Institute of Electronics, Sofia (Bulgaria), C. Boulmer-Leborgne – GREMI Université d’Orléans (France), I. Boyd - University College, Londres (UK), B.Chichkov - Lazer Centrum Hannover (Germany), V. Craciun - University of Florida (USA), P.Delaporte - LP3-CNRS Marseille (France), M. Dinescu - National Institute for Laser Plasma and Radiation Physics (Romania), E. Fogarassy - ENSPS Strasbourg (France), H. Fukumura - Tohoku university (Japan), H. Helvajian - Aerospace Corporation L.A. (USA), T. Lippert - Paul Scherrer Institute (Switzerland), J. G. Lunney - Trinity College Dublin (Ireland), E. Millon - Université d'Orléans (France), J. Reif - Brandenburg Technical University, Cottbus (Germany), P.Schaaf - Ilmenau University of Technology (Germany), R. Serna - CSIC, Instituto de Optica (Spain), T. Szoreny - Hungarian Academy of Sciences (Hungary).

 

  Gold Sponsors:

 Amplitudesystemes
 fianium
 lasing
 Newport
 Yokogawa
 NTUA
National Technical University of Athens 
 Quantel

Symposium organizers:

Ioanna Zergioti (main organizer)
National Technical University of Athens
Physics Department
Hroon Polytehneiou 9
Athens
Greece
Tel: +30 210772 3345
Fax:+30 210772 3338
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Robert Eason
Optoelectronics Research Centre
University of Southampton
Southampton SO171BJ
UK
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Magdalena Nistor
National Institute for Lasers, Plasmas and Radiation Physics
L22, PO Box MG-36
77125 Bucharest-Magurele
Romania
Tel: +4021 4574490
Fax:+4021 4574243
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Jacques Perrière
Institut des NanoSciences de Paris
Université Paris VI
Campus Boucicaut
140 rue de Lourmel
75015 Paris
France
Tel: +33 (0) 144 27 61 29
Fax:+33 (0) 143 54 28 78
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Javier Solis
Instituto de Optica-CSIC
Serrano 121
28006-Madrid
Spain
Tel: +34 915616800
Fax:+34 915645557
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